PRODUCT
RTP
Real RTP-Mini
SPECIFICATIONS
| Application | Rapid Thermal Annealing (RTA) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Rapid Thermal Diffusion (RTD) Ohmic Contact Annealing Crystallization |
|---|---|
| Product Sample | Si, Sapphire, Glass, Ceramic, etc. |
| Substrate Size | Piect to Max. 3inch or 50mm*50mm |
| Substrate Holder | Quartz |
| Temperature Range | 150~1,200℃ |
| Heating Rate | 10~50℃/sec |
| Control Zone | 1-Zone |
| Temperature Accuracy | ≤ ±3℃ |
| Temperature Repeatability | ≤ ±3℃ |
| Vacuum | Standard : ATM Option : 5.0E-3 Torr |
| Gas Supply | Option : Up to 3 process gas lines with digital MFC or Flow meter |
| Control | Manual control by Push Button (Include USB communication port) |
| Dimension (w*d*h) | 400mm*500mm*270mm or 650mm*450mm*250mm |
| Weight | 25kg to 55Kg |